Stress fracture of bilateral posterior facet after insertion of interspinous implant.

STUDY

DESIGN

A case report of stress fracture of bilateral lumbar posterior facet after implantation of interspinous process device is reported and the literature reviewed. OBJECTIVE.: To report the rare case of stress fracture of bilateral lumbar posterior facet after implantation of interspinous process device.

SUMMARY OF BACKGROUND DATA: A 64-year-old woman presented with severe back pain and radiating pain in both legs. In her history, she had undergone implantation of L4-L5 interspinous process device (Coflex, Paradigm Spine, Wurmlingen, Germany) for her neurogenic claudication at 6 years ago. Magnetic resonance image demonstrated signal change suggesting bilateral L4 inferior process. To the best of the authors' knowledge, there has been no report stress fracture of posterior facet after implantation of interspinous process device.

METHODS

This study reviewed the patient's medical record, her imaging studies, and related literatures.

RESULTS

In the reported case, stress fracture of bilateral posterior facet was documented with MRI and confirmed with surgical treatment for the surgical treatment of spinal stenosis. The involved facet joint was at the site affected by previously implanted interspinous process device.

CONCLUSION

Posterior facet fracture can occur as a complication of interspinous process device.