Cold atmospheric plasma (CAP) shows strain-dependence against Candida albicans growth on titanium.

OBJECTIVE

This study assessed the effect of cold atmospheric plasma (CAP) using argon and oxygen on Candida albicans biofilm growth on titanium.

METHODS

Titanium disks were treated with CAP at 10 and 20 min exposure using argon or oxygen plasma. Typical growth from an unspecified clinical Isolate Test Group (TG) (n = 8 for colony forming culture method, n = 8 for biofilm forming method) and resistant (ATCC 10,231) strain Positive Control (PC) (n = 8 for colony forming culture method, n = 8 for biofilm forming method) were tested. Negative Control (NC) was used, which involved plasma-untreated titanium plates (n = 2 for colony-forming culture method, n = 2 for biofilm-forming method). Colony-forming units (CFU) were counted, inactivation rates calculated, and biofilm quantified using optical density at 495 nm (OD495). ANOVA and two-sample tests were applied.

RESULTS

Oxygen plasma achieved 100% inactivation of TG, while argon plasma showed partial reduction. For resistant PC, oxygen plasma showed no effect, whereas argon achieved up to 99.5% inactivation. ANOVA revealed that group (TG vs PC) was the only significant factor (p = 0.011). Biofilm formation differed significantly between TG and PC (p = 0.014).

CONCLUSION

CAP shows strain-specific antifungal activity against C. albicans. Oxygen plasma effectively inhibited TG but not resistant strains, while argon plasma partially reduced both. CAP may have potential as an adjunctive antifungal strategy.