The Influence of the ITO Layers' Thicknesses on Their Chosen Physical Surface Parameters.

The paper presents the results concerning the influence of the thickness of the ITO and In2O3 layers deposited by the magnetron sputtering method on the physical parameters characterising their surface properties. The characterisation parameters were obtained by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and Kelvin probe. The increase in the layers' thickness related to the time of their fabrication causes an increase in the surface roughness and the value of the work function, followed by a decrease in the concentration of elements and compounds in the near-surface area.