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DOI 10.1111/jmi.70160

Медицинская библиотека · Journal of microscopy · 2026

A drift-aware framework for reliability assessment and image-based interpretation of atomic force microscopy measurements.

Deveci D Gemici, Ünverdi Ö, Yenen B, Sönmez S N, Özer H Ö

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Аннотация

Drift is one of the primary sources of uncertainty limiting the accuracy, repeatability, and reliability of scanning probe microscopy (SPM) measurements, with a particularly significant effect on the comparison of consecutive surface topography images. In this study, a two-module hybrid physical-computational framework is presented for the drift-aware interpretation and reliability assessment of consecutive AFM topography measurements. The first module integrates deep learning (DL)-based inter-frame correspondence extraction, geometric validation, physical coordinate reconstruction, scan-order-based acquisition-time assignment, inter-scan delay correction, and temperature synchronisation to generate a time-labelled drift representation. The second module uses this structured representation for comparative data-driven modelling and evaluates drift velocity ( v d ), model performance, and stability through temperature-included and temperature-excluded configurations. This structure enables the joint analysis of validated correspondences in terms of lateral displacement, relative height variation, acquisition time, v d , drift direction, and synchronously recorded ambient temperature, together with their physical coordinate labels. The results indicate that the proposed framework should be positioned not as a universal drift-correction method, but as a complementary and modular analysis approach that supports the drift-aware interpretation, comparison, and reliability assessment of consecutive AFM topography measurements.

Для цитирования: Deveci D Gemici, Ünverdi Ö, Yenen B, Sönmez S N, Özer H Ö. A drift-aware framework for reliability assessment and image-based interpretation of atomic force microscopy measurements.. Journal of microscopy. 2026. DOI: 10.1111/jmi.70160.
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