Surface analysis of 4-(bis(5-bromo-1H-indol-3-yl)methyl)phenol adsorbed on copper by spectroscopic experiments.

The new compound of 4-(bis(5-bromo-1H-indol-3-yl)methyl)phenol (BMP) is synthesized through a one-step reaction. Then the inhibition mechanism of inhibitor on copper surface is investigated by Fourier transform infrared (FT-IR) spectroscopy and X-ray photoelectron spectroscopy (XPS). Moreover, scanning electron microscopy-energy dispersive X-ray spectroscopy (SEM-EDS) is employed to characterize the surface morphology of studied copper and electrochemical impendence spectroscopy (EIS) is carried out to study the inhibition efficiency of the inhibitor. From these results obtained, it can be concluded that BMP is considered as corrosion inhibitor for copper in sulfuric solution.