Analytical model for the design of in situ horizontal permeable reactive barriers (HPRBs) for the mitigation of chlorinated solvent vapors in the unsaturated zone.

In this work we introduce a 1-D analytical solution that can be used for the design of horizontal permeable reactive barriers (HPRBs) as a vapor mitigation system at sites contaminated by chlorinated solvents. The developed model incorporates a transient diffusion-dominated transport with a second-order reaction rate constant. Furthermore, the model accounts for the HPRB lifetime as a function of the oxidant consumption by reaction with upward vapors and its progressive dissolution and leaching by infiltrating water. Simulation results by this new model closely replicate previous lab-scale tests carried out on trichloroethylene (TCE) using a HPRB containing a mixture of potassium permanganate, water and sand. In view of field applications, design criteria, in terms of the minimum HPRB thickness required to attenuate vapors at acceptable risk-based levels and the expected HPRB lifetime, are determined from site-specific conditions such as vapor source concentration, water infiltration rate and HPRB mixture. The results clearly show the field-scale feasibility of this alternative vapor mitigation system for the treatment of chlorinated solvents. Depending on the oxidation kinetic of the target contaminant, a 1m thick HPRB can ensure an attenuation of vapor concentrations of orders of magnitude up to 20years, even for vapor source concentrations up to 10g/m3. A demonstrative application for representative contaminated site conditions also shows the feasibility of this mitigation system from an economical point of view with capital costs potentially somewhat lower than those of other remediation options, such as soil vapor extraction systems. Overall, based on the experimental and theoretical evaluation thus far, field-scale tests are warranted to verify the potential and cost-effectiveness of HPRBs for vapor mitigation control under various conditions of application.